@inproceedings{Bal.03,
    author = {S.V. Babin and A.B. Kahng and I.I. Mandoiu and S. Muddu},
    title = {Subfield scheduling for throughput maximization in electron-beam photomask fabrication},
    booktitle = {Emerging Lithographic Technologies VII},
    year = {2003},
    volume = {5037},
    series = {Proc. SPIE},
    pages = {934-942},
    note = {Bal.03.ppt},
    url = {http://dx.doi.org/10.1117/12.484981},
    file = {Bal.03.pdf},
    confidential = {n}
}