@inproceedings{Bal.03a,
    author = {S.V. Babin and A.B. Kahng and I.I. Mandoiu and S. Muddu},
    title = {Resist Heating Dependence on Subfield Scheduling in 50kV Electron Beam Maskmaking},
    booktitle = {Photomask and Next-Generation Lithography Mask Technology X},
    year = {2003},
    volume = {5130},
    series = {Proc. SPIE},
    pages = {718-726},
    url = {http://dx.doi.org/10.1117/12.512442},
    keywords = {lab},
    file = {Bal.03a.pdf},
    confidential = {n}
}